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Edited by David C. Paine 、John C. Bravman (1)
Edited by John C. Bravman 、Thomas N. Marieb 、James R. Lloyd 、Matt A. Korhonen (1)
Edited by John C. Bravman 、William D. Nix 、David M. Barnett 、David A. Smith (1)
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CAMBRIDGE UNIVERSITY PRESS (3)

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Laser Ablation for Materials Synthesis:VOLUME191
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作者:Edited by David C. Paine ; John C. Bravman  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:1990/11/15 裝訂:平裝
Proceedings of the MRS symposium held April 1990, San Francisco, California. Annotation copyright Book News, Inc. Portland, Or.
定價:1665 元, 優惠價:9 1499
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Thin Films::Stresses and Mechanical Properties I:VOLUME130
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作者:Edited by John C. Bravman ; William D. Nix ; David M. Barnett ; David A. Smith  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:1989/04/13 裝訂:平裝
Fifty-six contributions from a symposium held November 1988, Boston, Mass. On important aspects of stresses and mechanical properties in thin film technologies and on experimental techniques for study
定價:1665 元, 優惠價:9 1499
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Materials Reliability in Microelectronics VIII:VOLUME516
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作者:Edited by John C. Bravman ; Thomas N. Marieb ; James R. Lloyd ; Matt A. Korhonen  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:1998/11/11 裝訂:平裝
Novel measurement techniques, microstructural effects, reliability modelling, stress effects, advanced interconnect reliability, and adhesion and fracture are the concerns of the 49 papers. Invited pr
定價:1665 元, 優惠價:9 1499
無庫存,下單後進貨(到貨天數約30-45天)

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