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熱搜： 漫畫少年學墨菲定律、 遠在謙邊（特裝版/無親簽）、 軍國主義下的性治理、 撼山河 撼向世界、 新譯老子解義、 有點喜歡、 我們的「女食」故事、 The Little Book of Joy、 職場真心話、 新基本小六法

熱搜： 漫畫少年學墨菲定律、 遠在謙邊（特裝版/無親簽）、 軍國主義下的性治理、 撼山河 撼向世界、 新譯老子解義、 有點喜歡、 我們的「女食」故事、 The Little Book of Joy、 職場真心話、 新基本小六法

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商品類型

原文書 （11）

商品狀況

可訂購商品 （11）

庫存狀況

無庫存 （11）

商品定價

$800以上 （11）

出版日期

2020~2021 （1）
2018~2019 （2）
2016~2017 （2）
2016年以前 （6）

裝訂方式

平裝 （1）
精裝 （10）

作者

Rajiv Kohli/ Kashmiri L. Mittal （5）
Rajiv Kohli (EDT)/ Kashmiri L. Mittal (EDT) （3）
Kohli, Rajiv (National Aeronautics and Space Administration, Houston, TX, USA),Mittal, Kashmiri L. (Editor, Reviews of Adhesion and Adhesives, USA) （1）
Rajiv Kohli (EDT)/ K. L. Mittal (EDT) （1）
Rajiv Kohli (EDT)/ K.l. Mittal (EDT) （1）

出版社/品牌

Elsevier Science Ltd （8）
William Andrew Pub （2）
Elsevier Science Publishing Co Inc （1）

三民網路書店 / 搜尋結果

共11筆商品，1/1頁
Developments in Surface Contamination - Methods of Cleaning and Cleanliness Verification ― Sources, Generation, and Behavior of Contaminants

1.Developments in Surface Contamination - Methods of Cleaning and Cleanliness Verification ― Sources, Generation, and Behavior of Contaminants

作者：Rajiv Kohli; Kashmiri L. Mittal  出版社：Elsevier Science Ltd  出版日：2013/06/12 裝訂：精裝
In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for
無法訂購
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02-25006600[分機130、131]。
Developments in Surface Contamination and Cleaning - Contaminant Removal and Monitoring

2.Developments in Surface Contamination and Cleaning - Contaminant Removal and Monitoring

作者：Rajiv Kohli; Kashmiri L. Mittal  出版社：Elsevier Science Ltd  出版日：2012/11/29 裝訂：精裝
In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance fo
無法訂購
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02-25006600[分機130、131]。
Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

3.Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning

作者：Rajiv Kohli; Kashmiri L. Mittal  出版社：William Andrew Pub  出版日：2016/11/21 裝訂：精裝
The purpose of the Developments in Surface Contamination and Cleaning series is to provide a state-of-the-art guide to the current knowledge of the behaviour of film-type and particulate surface conta
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Developments in Surface Contamination and Cleaning ― Types of Contamination and Contamination Resources

4.Developments in Surface Contamination and Cleaning ― Types of Contamination and Contamination Resources

作者：Rajiv Kohli; Kashmiri L. Mittal  出版社：Elsevier Science Ltd  出版日：2016/11/30 裝訂：精裝
Developments in Surface Contamination and Cleaning, Volume Ten provides a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their cl
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Developments in Surface Contamination and Cleaning: Methods for Removal of Particle Contaminants

5.Developments in Surface Contamination and Cleaning: Methods for Removal of Particle Contaminants

作者：Rajiv Kohli; Kashmiri L. Mittal  出版社：William Andrew Pub  出版日：2011/04/01 裝訂：精裝
The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a l
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02-25006600[分機130、131]。
Developments in Surface Contamination and Cleaning ― Cleaning Techniques

6.Developments in Surface Contamination and Cleaning ― Cleaning Techniques

作者：Rajiv Kohli (EDT); Kashmiri L. Mittal (EDT)  出版社：Elsevier Science Ltd  出版日：2014/11/20 裝訂：精裝
As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effe
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02-25006600[分機130、131]。
Developments in Surface Contamination and Cleaning ― Cleanliness Validation and Verification

7.Developments in Surface Contamination and Cleaning ― Cleanliness Validation and Verification

作者：Rajiv Kohli (EDT); Kashmiri L. Mittal (EDT)  出版社：Elsevier Science Ltd  出版日：2014/11/20 裝訂：精裝
As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not
無法訂購
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02-25006600[分機130、131]。
Developments in Surface Contamination and Cleaning ― Fundamentals and Applied Aspects

8.Developments in Surface Contamination and Cleaning ― Fundamentals and Applied Aspects

作者：Rajiv Kohli (EDT); Kashmiri L. Mittal (EDT)  出版社：Elsevier Science Ltd  出版日：2015/11/16 裝訂：精裝
Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods
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Developments in Surface Contamination and Cleaning ― Applications of Cleaning Techniques

9.Developments in Surface Contamination and Cleaning ― Applications of Cleaning Techniques

作者：Rajiv Kohli (EDT); K.l. Mittal (EDT)  出版社：Elsevier Science Ltd  出版日：2018/12/17 裝訂：精裝
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recen
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Developments in Surface Contamination and Cleaning ― Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants

10.Developments in Surface Contamination and Cleaning ― Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants

作者：Rajiv Kohli (EDT); K. L. Mittal (EDT)  出版社：Elsevier Science Ltd  出版日：2019/06/08 裝訂：精裝
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Surfactants in Precision Cleaning：Removal of Contaminants at the Micro and Nanoscale

11.Surfactants in Precision Cleaning：Removal of Contaminants at the Micro and Nanoscale

作者：Kohli; Rajiv (National Aeronautics and Space Administration; Houston; TX; USA); Mittal; Kashmiri L. (Editor; Reviews of Adhesion and Adhesives; USA)  出版社：Elsevier Science Publishing Co Inc  出版日：2021/09/01 裝訂：平裝
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