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【簡體曬書區】 單本79折,5本7折,活動好評延長至5/31,趕緊把握這一波!
Handbook of Instrumentation and Techniques for Semiconductor Nanostructure Characterization
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Handbook of Instrumentation and Techniques for Semiconductor Nanostructure Characterization

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9015728
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Materials characterization through nano-scale investigation is key to the great leaps that nanotechnology is bringing to materials creation. The editors acknowledge that advances are proceeding at a breakneck pace, but nevertheless they expect that this reference will serve as a solid base of information. Two volumes--the first two in the World Scientific Series in Materials and Energy--comprise this set. Editors Haight, Ross and Hannon (all affiliated with IBM TJ Watson Research Center) introduce the handbook and explain its organization in four main sections: electron microscopies, X-ray diffraction techniques, scanning probes, and atom and optical probes. More specifically, 13 chapters address SEM instrumentation and practical examples; transmission electron microscopy and ultra-high vacuum transmission electron microscopy (TEM and UHV TEM); aberration corrected, and low-energy electron microscopy; ultrafast microscopy of plasmon dynamics in nanostructured metal surfaces; x-ray diffraction methods for studying strain and composition in epitaxial nanostructured systems, among other topics. Annotation c2013 Book News, Inc., Portland, OR (booknews.com)

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