薄膜材料科學(第二版)(英文版)（簡體書）

本書詳細介紹了涉及薄膜材料科學的各個方面，內容包括真空技術、薄膜沉積技術與原子過程、薄膜的結構與性能表征等。本書內容廣泛，資料全面，各章后面附有習題，是一本真正意義上的薄膜科學與技術的教科書。該書自1992 年第1版問市以來，深受材料科學界的廣泛歡迎。非常適用于從事薄膜材料研究的專業研究人員、材料類院系高年級本科生和研究生作教材或參考書。本書由中國科學院物理研究所研究員曹則賢先生特別推薦。

Milton Ohring, 生於1936年，美國史第文斯理工學院材料工程學系教授，在此職位上工作37年期間，一直活躍在講臺。同時，作者還是材料科學、薄膜技術、微電子學等領域的資深研究專家。其他相關著作還有Engineering Materials science,Academic Press(1995),Reliability&failure of electronic Materials &Devices,Academic Press(1998)等。

ForewordtoFirstEdition
Preface
Acknowledgments
AHistoricalPerspective
Chapter1 AReviewofMaterialsScience
1.1 Introduction
1.2 Structure
1.3 DefectsinSolids
1.4 BondsandBandsinMaterials
1.5 ThermodynamicsofMaterials
1.6 Kinetics
1.7 Nucleation
1.8 AnIntroductiontoMechanicalBehavior
1.9 Conclusion
Exercises
References
Chapter2 VacuumScienceandTechnology
2.1 Introduction
2.2 KineticTheoryofGases
2.3 GasTransportandPumping
2.4 VacuumPumps
2.5 VacuumSystems
2.6 Conclusion
Exercises
References
Chapter3 Thin-FilmEvaporationProcesses
3.1 Introduction
3.2 ThePhysicsandChemistryofEvaporation
3.3 FilmThicknessUniformityandPurity
3.4 EvaporationHardware
3.5 EvaporationProcessesandApplications
3.6 Conclusion
Exercises
References
Chapter4 Discharges,Plasmas,andIon-SurfaceInteractions
4.1 Introduction
4.2 Plasmas,Discharges,andArcs
4.3 FundamentalsofPlasmaPhysics
4.4 ReactionsinPlasmas
4.5 PhysicsofSputtering
4.6 IonBombardmentModificationofGrowingFilms
4.7 Conclusion
Exercises
References
Chapter5 PlasmaandIonBeamProcessingofThinFilms
5.1 Introduction
5.2 DC,AC,andReactiveSputteringProcesses
5.3 MagnetronSputtering
5.4 PlasmaEtching
5.5 HybridandModifiedPVDProcesses
5.6 Conclusion
Exercises
References
Chapter6 ChemicalVaporDeposition
6.1 Introduction
6.2 ReactionTypes
6.3 ThermodynamicsofCVD
6.4 GasTransport
6.5 FilmGrowthKinetics
6.6 ThermalCVDProcesses
6.7 Plasma-EnhancedCVDProcesses
6.8 SomeCVDMaterialsIssues
6.9 Safety
6.10 Conclusion
Exercises
References
Chapter7 SubstrateSurfacesandThin-FilmNucleation
7.1 Introduction
7.2 AnAtomicViewofSubstrateSurfaces
7.3 ThermodynamicAspectsofNucleation
7.4 KineticProcessesinNucleationandGrowth
7.5 ExperimentalStudiesofNucleationandGrowth
7.6 Conclusion
Exercises
References
Chapter8 Epitaxy
8.1 Introduction
8.2 ManifestationsofEpitaxy
8.3 LatticeMisfitandDefectsinEpitaxialFilms
8.4 EpitaxyofCompoundSemiconductors
8.5 High-TemperatureMethodsforDepositingEpitaxialSemiconductorFilms
8.6 Low-TemperatureMethodsforDepositingEpitaxialSemiconductorFilms
8.7 MechanismsandCharacterizationofEpitaxialFilmGrowth
8.8 Conclusion
Exercises
References
Chapter9 FilmStructure
9.1 Introduction
……
Chapter10 CharacterizationofThinFilmsandSurfaces
Chapter11 Interdiffusion,Reactions,andTransformationsinThinFilms
Chapter12 MechanicalPropertiesofThinFilms
Index