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Edited by Suryadevara V. Babu 、Kenneth C. Cadien 、Hiroyuki Yano (1)
Suryadevara Babu (1)

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CAMBRIDGE UNIVERSITY PRESS (1)
Elsevier Science Health Science div (1)

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2筆商品,1/1頁

1.Advances in Chemical Mechanical Planarization (Cmp)

作者:Suryadevara Babu  出版社:Elsevier Science Health Science div  出版日:2016/01/08 裝訂:精裝

Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so a

定價:12825元   優惠價: 911543

無庫存,下單後進貨(採購期約45個工作天)

2.Chemical-Mechanical Polishing 2001 – Advances and Future Challenges:VOLUME671

作者:Edited by Suryadevara V. Babu ;Kenneth C. Cadien ;Hiroyuki Yano  出版社:CAMBRIDGE UNIVERSITY PRESS  出版日:2001/12/14

Papers from an April 2001 symposium describe recent advances in the practice of chemical-mechanical polishing (CMP) and in modeling the interactions that occur between the wafer surface and the pad an

定價:1665元   優惠價: 91499

無庫存,下單後進貨(採購期約45個工作天)